| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device which can suppress the generation of the intensity unevenness of an illumination light on a mask surface in an EUV exposure device configured by using a plurality of reflecting members. <P>SOLUTION: The exposure device includes a plasma light source 20 for supplying the illumination light, a light source 2 having a beam condensing mirror 27 for condensing the illumination light from the plasma light source 20, and an exposure unit 3 having an illumination optical system IL for illuminating the mask M with the illumination light from the light source 2 to expose the pattern of the mask M to a photosensitive substrate W. In the exposure device, the illumination optical system IL has a fly eye mirror having a plurality of element mirrors. The beam condensing mirror 27 has a plurality of partial mirrors for condensing the illumination light. The partial mirror has the shape defined based on the outline shape of an assembly having at least two element mirrors of the plurality of the element mirrors. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
