发明名称 MASK, FILM DEPOSITION METHOD AND METHOD FOR PRODUCING ORGANIC EL SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a mask capable of obtaining an objective film pattern with high precision even if the mask members to be used are large. SOLUTION: The mask comprises: a base member 2 having opening parts 7; and mask members 3 on the base member 2 each arranged at the position covering the opening part 7 and provided with a mask opening part 4 with a prescribed pattern. The mask opening part 4 has an opening area smaller than the area of a film to be formed. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006077297(A) 申请公布日期 2006.03.23
申请号 JP20040263365 申请日期 2004.09.10
申请人 SEIKO EPSON CORP 发明人 IKEHARA TADAYOSHI
分类号 C23C14/04;C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/04
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