发明名称 |
MASK, FILM DEPOSITION METHOD AND METHOD FOR PRODUCING ORGANIC EL SYSTEM |
摘要 |
PROBLEM TO BE SOLVED: To provide a mask capable of obtaining an objective film pattern with high precision even if the mask members to be used are large. SOLUTION: The mask comprises: a base member 2 having opening parts 7; and mask members 3 on the base member 2 each arranged at the position covering the opening part 7 and provided with a mask opening part 4 with a prescribed pattern. The mask opening part 4 has an opening area smaller than the area of a film to be formed. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006077297(A) |
申请公布日期 |
2006.03.23 |
申请号 |
JP20040263365 |
申请日期 |
2004.09.10 |
申请人 |
SEIKO EPSON CORP |
发明人 |
IKEHARA TADAYOSHI |
分类号 |
C23C14/04;C23C14/24;H01L51/50;H05B33/10 |
主分类号 |
C23C14/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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