| 摘要 |
The invention relates to a device for measuring at least one process parameter of a medium (40), whereby the device measures the process parameter at least with a given measurement amplitude (A) and a given cycle rate (T), with a related power requirement (E). According to the invention, a controller (25) is provided which operates the device in a monitoring mode (Pl), or in a measuring mode (P2), whereby the device measures with a first measuring amplitude (Al) and a first cycle rate (Tl) in the monitoring mode (Pl), the device measures with a second measuring amplitude (A2) and a second cycle rate (T2) in the measuring mode (P2), the first cycle rate (Tl) being greater than the second cycle rate (T2) and a first power requirement (El) for the monitoring mode (Pl) and a second power requirement (E2) for the measuring mode (P2) are essentially the same. The invention further relates to a corresponding method. |
