发明名称 |
Lithographic apparatus, alignment system, and device manufacturing method |
摘要 |
A lithographic apparatus according to one embodiment includes an alignment system for aligning a substrate. The alignment system comprises an illuminator system configured to illuminate an alignment mark on the substrate with an illumination spot, the alignment mark comprising a plurality of lines and spaces. The system also includes a combiner system configured to transfer two-images of the illuminated alignment mark without spatial filtering of the images, rotate the images 180° relatively to each other, and combine the two images; and a detection system configured to detect an alignment signal from the combined images and to determine a unique alignment position by selecting a specific one of extreme values in the detected alignment signal.
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申请公布号 |
US2006061743(A1) |
申请公布日期 |
2006.03.23 |
申请号 |
US20040946334 |
申请日期 |
2004.09.22 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DEN BOEF ARIE J.;JEUNINK ANDRE B.;MARIA PELLEMANS HENRICUS P.;SETIJA IRWAN D.;VAN NUENEN CAS JOHANNES PETRUS M.;KEIJ STEFAN CAROLUS JACOBUS A. |
分类号 |
G03B27/42 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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