Apparatus for forming nanoholes and method for forming nanoholes

摘要

A vacuum chamber 1 has a plasma generating space 11 in its interior. A magnetic field generating means 4 applies a fluctuating magnetic field to the plasma generating space 11 to cause plasma there to fluctuate. A substrate 6 is placed in the plasma generating space 11 so that when a potential difference is evoked between a first conductor 61 and a second conductor 62 as a result of the fluctuation of plasma, the potential difference can cause nanoholes to be formed in the substrate 6.