| 摘要 |
A feedback loop cleaning system to remove deposits formed on interior surfaces of a processing chamber that includes a flow controller to set a flow rate for a cleaning gas mixture supplied to a plasma generating system, where the plasma generating system forms a plasma from the cleaning gas mixture, said plasma including a reactive cleaning species; a detector to generate a feedback signal having information about a concentration of a reaction product formed by a reaction of the reactive cleaning species with the deposits formed on the interior surfaces of the processing chamber; and a processor to convert the feedback signal into a control signal, wherein the control signal is used to adjust the flow rate of the cleaning gas mixture at the flow controller. Also, a method of removing deposits formed on interior surfaces of the processing chamber. |
