发明名称 LITHOGRAPHY EQUIPMENT AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a structure of an actuator structured such that it can move an object at least at six degree of freedom. <P>SOLUTION: A substrate or a patterning device used for lithography equipment and a lithography device manufacturing method are presented. The substrate and the patterning device are aligned with a patterning boom, and are held by a support in a movable manner. However, due to the resonance of the support, a manufactured device may become unstable or the control system may become complicated, or both of them may be resulted in. Accordingly, an actuator assembly frame having a flexibly joining device connected to the support is provided with some actuators that are structured so as to move the support at several degree of freedom. In this way, the resonance is attenuated by a flexibly joined device, and as a result, the control system's band is expanded, thus improving the support's positioning accuracy. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006080527(A) 申请公布日期 2006.03.23
申请号 JP20050260917 申请日期 2005.09.08
申请人 ASML NETHERLANDS BV 发明人 ZAAL KOEN JACOBUS JOHANNES MARIA;BUIS EDWIN J;COX HENRIKUS HERMAN MARIE;GILISSEN NOUD J;SCHOOT HARMEN KLAAS VAN DER
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址