| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a stencil mask which is easily made thin and easily subjected to stress control and which has high processing property, high strength of the film, high pattern accuracy and excellent electron beam irradiation characteristics, and also to provide a method for manufacturing the mask. <P>SOLUTION: The mask comprises a substrate, and a mask base supported by the substrate and having a transmissive hole pattern where a charge particle beam passes. The mask base consists of a diamond film containing nitrogen by≥3×10<SP>18</SP>cm<SP>-3</SP>. The diamond film is deposited by a plasma CVD method using a source material gas containing hydrocarbon, hydrogen and≥0.5% nitrogen source gas. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
