| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an excellent method for hydrogenation reaction and to provide an inexpensive and excellent system for hydrogenation reaction, excellent in controllability/energy saving, by using a material excellent in thermal/chemical stability and selectively penetrating only hydrogen, that solves problems of conventional method for hydrogenation reaction which has an important proportion in reaction processes of chemical industry and petroleum industry and requires a lot of work and energy for improving efficiency of gas-liquid contact, reaction control, and purification of hydrogen gas and the expensive cost for the system because the reaction requires a high pressure. <P>SOLUTION: The invention relates to the system for hydrogenation reaction wherein the hydrogenation reaction is carried out by feeding the hydrogen to a raw material in the reaction chamber 13 through a partition wall comprising a semiconductor film 1 having a p-type conductivity and a porous film 2. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
