发明名称 REACTOR AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a chip type reactor having a flow passage manufactured precisely on a substrate, capable of exhibiting thereby an aiming device function sufficiently, and suitable for mass production. SOLUTION: This chip type reactor 1 is provided with a glass substrate 11 and a resin film layer 12. The resin film layer 12 is arranged on the substrate 11, and forms on the substrate 11 a plurality of vessels 21, 22 for introducing a fluid for a sample, and the flow passage 23 for communicating the plurality of vessels. The resin film layer 12 is formed of a photosensitive resin. The plurality of vessels 21, 22 comprise a reaction vessel, a waste liquid vessel and a silica vessel for adsorbing a DNA. The reaction vessel 21 is communicated each other with the waste liquid vessel 22 via the flow passage 23, and the silica vessel 25 is arranged in a midway of the flow passage 23 to be subjected to DNA extraction. Electrodes 14 for impressing a voltage are arranged respectively in the reaction vessel 21 and the waste liquid vessel 22. The silica vessel 25 is covered with a cover glass 13. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006078475(A) 申请公布日期 2006.03.23
申请号 JP20050231249 申请日期 2005.08.09
申请人 NSK LTD 发明人 IKEDA NORIFUMI;KATO SADATOSHI;HATSUZAWA TAKESHI
分类号 G01N35/08;B01J19/00;C12M1/00;C12M1/26;C12M1/42;G01N1/00;G01N37/00 主分类号 G01N35/08
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