发明名称 THIN FILM COVERAGE MEASUREMENT METHOD AND FILM THICKNESS CHANGE DETECTION METHOD FOR THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a thin film coverage evaluation method for measuring coverage in a minute area of a thin film even if the thin film and the material of a substrate with the thin film formed thereon contain the same material. SOLUTION: A silicon substrate 5 with a silane coupling film 2 formed thereon for analytical curve preparation is measured by an S-SIMS measurement method to obtain an ion strength ratio (PFPE ion strength value/silicon ion strength value) for the analytical curve between the strength value of organic PFPE ions contained in the coupling film 2 and the strength value of silicon ions. The analytical curve for finding the coverage is prepared, based on the strength ratio for the analytical curve. Then, the silicon substrate 5 with an actual silane coupling film 2 formed thereon is measured by the measurement method to obtain a specimen ion strength ratio between the strength value of PFPE ions contained in the coupling film 2 and the strength value of silicon ions. The prepared analytical curve is used for evaluating coverage from the specimen ion strength ratio. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006078309(A) 申请公布日期 2006.03.23
申请号 JP20040261988 申请日期 2004.09.09
申请人 SEIKO EPSON CORP 发明人 KUZE RYOTA;SHIMAOKA HARUKO;SHIMIZU TOSHIHIRO;ICHIKAWA YUUEI
分类号 G01N23/225;G01B15/00;G01B15/02;G01N23/203 主分类号 G01N23/225
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