COMPOSITION FOR FORMING ANTIREFLECTIVE FILM AND WIRING FORMING METHOD USING SAME
摘要
<p>Disclosed is an antireflective film-forming material which enables to obtain a large etching rate difference between a resist pattern and an antireflective film. Specifically disclosed is a composition for forming antireflective films which contains a siloxane polymer (A) containing a light absorptive compound group.</p>
申请公布号
WO2006030641(A1)
申请公布日期
2006.03.23
申请号
WO2005JP15907
申请日期
2005.08.31
申请人
TOKYO OHKA KOGYO CO., LTD.;TANAKA, TAKESHI;SAKAMOTO, YOSHINORI;TAKAHAMA, MASARU
