| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a viscous dispersion containing semiconductor nano-sized particles which is useful for forming a high purity porous semiconductor film by low-temperature film deposition. <P>SOLUTION: The viscous dispersion is one in which crystalline semiconductor nano-sized particles are dispersed in a dispersion medium, wherein the dispersion medium is a solvent mixture which comprises 53-92 mass% of a hydrophilic organic solvent that contains 3-5C alcohols as the main components and 8-47 mass% of water and which does not comprise 2 mass% or more of an organic binder, and wherein the crystalline semiconductor nano-sized particles are dispersed in the dispersion in an amount of 8-40 mass% against the total dispersion. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
