发明名称 VACUUM TREATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a plasma treating apparatus in which seal performance is stabilized with high reliability. SOLUTION: The valve treating apparatus includes a vacuum container whose inside is depressurized, an aperture which is arranged at the wall of this vacuum container and a sample of an object to be treated is exchanged in those inside and outside, a valve body 701 which is arranged on the outside of the wall, and blocks and opens the aperture airtightly, and a drive part which drives this valve body and blocks and opens the valve body. In the valve treating apparatus, the drive part includes a first member 705 coupled to a drive unit 702 to move along the first direction of a substantially straight line state as the result of the operation of this drive unit, a second member 706 coupled to this first member 705 to move along the second direction of substantially straight line state crossing with the first direction, and the valve body 701 coupled to this second member to block the aperture part as the result of the movement of this second member. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006080365(A) 申请公布日期 2006.03.23
申请号 JP20040263968 申请日期 2004.09.10
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TAUCHI TSUTOMU;MAKINO AKITAKA
分类号 H01L21/3065;H01L21/677 主分类号 H01L21/3065
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