发明名称 Process for manufacturing wafers of semiconductor material by layer transfer
摘要 A process manufactures a wafer using semiconductor processing techniques. A bonding layer is formed on a top surface of a first wafer; a deep trench is dug in a substrate of semiconductor material belonging to a second wafer. A top layer of semiconductor material is formed on top of the substrate so as to close the deep trench at the top and form at least one buried cavity. The top layer of the second wafer is bonded to the first wafer through the bonding layer. The two wafers are subjected to a thermal treatment that causes bonding of at least one portion of the top layer to the first wafer and widening of the buried cavity. In this way, the portion of the top layer bonded to the first wafer is separated from the rest of the second wafer, to form a composite wafer.
申请公布号 US2006063352(A1) 申请公布日期 2006.03.23
申请号 US20050225883 申请日期 2005.09.13
申请人 STMICROELECTRONICS S.R.I 发明人 BARLOCCHI GABRIELE;VILLA FLAVIO F.
分类号 H01L21/30;H01L21/20;H01L21/304;H01L21/324;H01L21/762 主分类号 H01L21/30
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