发明名称 Polycrystalline silicon for use in solar energy production is produced by passing silane gas over heated silicon seed rod in sealed reactor at high temperature, so that it is thermally decomposed or reduced with hydrogen
摘要 <p>Polycrystalline silicon for use in solar energy production is produced by passing silane gas over a heated silicon seed rod in a sealed reactor at high temperature. The gas is thermally decomposed or reduced with hydrogen to produce a material with p- or n-conductivity, a specific resistance of 3 -500 ohm-cm and a life of 2 - 500 microseconds. Independent claims are included for: (A) silicon chips produced by crystallization of the polycrystalline material without adding a dopant; (B) a method for making the polycrystalline material, as described; and (C) a method for making the polycrystalline material using a seed rod made from the polycrystalline material with an internal heat source and a second heat source made from a metal or alloy with a recrystallization temperature of 1100[deg]C or more or from graphite.</p>
申请公布号 DE102005044328(A1) 申请公布日期 2006.03.23
申请号 DE20051044328 申请日期 2005.09.16
申请人 SUNRIC CO., LTD.;SHIN-ETSU FILM CO., LTD. 发明人 KATO, YASUHIRO;HAGIMOTO, HIROSHI;HONGU, TATSUHIKO
分类号 H01L31/0368;C30B28/14;H01L31/18 主分类号 H01L31/0368
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