| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a stencil mask with high pattern accuracy and yield. <P>SOLUTION: The method of manufacturing the stencil mask includes a step of preparing a structure in which a mask material layer is formed on a substrate, a step of forming an inorganic resist layer on the mask material layer, a step of patterning by a lithography after the organic resist layer is coated on the inorganic resist layer and forming the organic resist pattern, a step of etching the inorganic resist layer by using the organic resist pattern as an etching mask and forming an inorganic resist pattern, a step of forming a stencil mask substrate by working the rear surface of the substrate, a step of etching the mask material layer using the inorganic resist pattern as an etching mask and forming a mask body, and a step of removing the inorganic resist pattern. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
