| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a liquid crystal display device wherein the number of masks used for manufacturing thin film transistors and to provide a fabrication method thereof. <P>SOLUTION: The fabrication method of the liquid crystal display device includes steps for: providing first and second substrates; forming an active layer on the first substrate, wherein the active layer includes a source region, a drain region, a channel region and a storage region; forming a first insulation layer on the first substrate; forming a gate electrode, a gate line, a pixel electrode, and a storage line on the first substrate; forming a second insulation layer on the first substrate; forming first and second contact holes through the first and second insulation layers, wherein the first and second contact holes expose respective ones of the source and drain regions; forming a pixel hole through the second insulation layer, wherein the pixel hole exposes the pixel electrode; forming a source electrode electrically connected to the source region through the first contact hole and a drain electrode electrically connected to the drain region through the second contact hole; and forming a liquid crystal layer between the first and second substrates. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
