| 摘要 |
<p>Phase stepped and paired piston SLM configurations are described, with attention to rasterization and image stability. In contrast to attenuated phase-shift reticle performance of simple titling mirror SLMs, these configuration have phase shifting capabilities emulating a hard phase shift reticle and beyond. To use a straight-forward rasterization architecture where individual pixels are determined by the local pattern data, the SLM is operated so that the complex amplitude created by a mirror or mirror pair is confined to the real axis. The tilting phase-step mirror SLM gives a new set of rules for lithography: no penalty for phase shift over binary, no penalty for OPC verses non-OPC pattern, seamless pattern decompositions, optimal tones for each pattern, etc. This gives performance and flexibility never seen before.</p> |
