SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, SEALED CONTAINER STORAGE APPARATUS, PROGRAM, AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing system preventing dust from adhering to a substrate without enhancing the cleanliness of a clean room to a predetermined level and improving the throughput of substrate processing without increasing the burden of operators. SOLUTION: A plasma processing system 1 is provided with a plasma processing apparatus 2, an SMIF 4 and a spare loader 5. The spare loader 5 has: a stand-like unprocessed pod port 28 mounting an unprocessed pod 3 to store it; a shelf-like processed pod port 29 mounting a processed pod 3 to store it; a pod arm 31 transferring the unprocessed pod 3 to the pod mounting part 24 of the SMIF4 from the unprocessed pod port 28 and transferring the processed pod 3 to the processed pod port 29 from the pod mounting part 24. COPYRIGHT: (C)2006,JPO&NCIPI