| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To improve contrast and DOF (Depth Of Focus) in the formation of a pattern in a desired shape. Ž<P>SOLUTION: A main pattern 101 transferred by exposure is laid on a transmissive substrate 100. The main pattern 101 has a half-shielding part 101A which partially transmits the exposure light and has a first transmittance, and a phase shifter 101B. A pair of auxiliary patterns 102 which diffracts the exposure light and is not transferred by exposure is laid on either side of the main pattern 101 on the transmissive substrate 100. Ž<P>COPYRIGHT: (C)2004,JPO&NCIPI Ž</p> |
