| 摘要 |
PURPOSE:To obtain a photoconductive material always stabilized in electrical, optical, and photoconductive characteristics, by laminating a photoconductive layer made of a specified amorphous silicon and a surface barrier layer made of a specified amorphous silicon on a substrate. CONSTITUTION:A photoconductive material 100 has a laminate structure consisting of a substrate 101 as a conductive material, a photoconductive layer 102 overlaid on this substrate 101, and a surface barrier 103 overlaid in direct contact with the layer 102. The layer 102 is composed of an amorphous material containing silicon as a main component and H and/or halogen. The layer has a function for preventing carriers from intruding into the layer 102 from the surface. It consists of an amorphous material containing boron as a main component and H and halogen. In addition, a lower barrier layer may be formed between the substrate 101 and the layer 102 in order to prevent injection of carriers from the substrate 101 into the layer 102. |
