| 发明名称 |
IMAGING METHOD USING PHASE BOUNDARY MASKING WITH MODIFIED ILLUMINATION |
| 摘要 |
A projection lithography system provides a cross-quadrupole illumination pattern in combination with a translucent substrate having boundary relief features. The features are spaced close together so that they are not imaged in a focal plane, but generate a dark image of the space between the features in the focal plane. |
| 申请公布号 |
EP1240557(A4) |
申请公布日期 |
2006.03.22 |
| 申请号 |
EP20000978666 |
申请日期 |
2000.11.15 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
SMITH, BRUCE, W.;PETERSON, JOHN, S. |
| 分类号 |
G03F9/00;G02B27/12;G02B27/46;G03B27/32;G03B27/42;G03B27/54;G03C5/00;G03F1/00;G03F7/20;G21G5/00;H01L21/027 |
主分类号 |
G03F9/00 |
| 代理机构 |
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