| 摘要 |
PURPOSE:To enable an elctron beam exposure of high accuracy and fineness by performing a highly precise measurement of table positioning through the improvement of the structure of fixing a light reflecting body onto a table. CONSTITUTION:The table 2 is provided for free movements in an exposure chamber 1. A sample 3 is mounted on the table 2 and applied for electron beam exposure. A light reflector 4 is installed on the end part of the table 2 via a base plate 8, and a mirror body 5 finished the mirror surface at high accuracy is fixed on the side surface of the light reflector 4. Besides, the mirror surface with high flatness can be formed also by polishing one side surface of the light reflector 4. Thus, laser light is irradiated from a laser interferometer provided at the opposed position to the mirror body 5 of the light reflector 4 installed on the table 2 resulting in the measurement of a table position from the laser interference thereof with the reflected light. Therefore, the positioning can be accurately performed without offering strain to the light reflecting surface. |
