发明名称 |
Apparatus and method for exposing a radiation sensitive layer by means of charged particles as well as a mask for this purpose |
摘要 |
A projection apparatus for imaging a pattern of a mask onto a substrate by means of a beam of projected charged particles is disclosed. The apparatus includes a radiation sensitive layer. The apparatus also includes a mask. The mask includes a membrane layer made of a first material, scattering regions forming the pattern and made of a second material scattering the charged particles more than the membrane layer, and a plurality of straightly extending supporting struts spaced apart from one another and supporting the membrane layer together with the scattering regions. The apparatus also includes a projection apparatus. The projection apparatus includes a beam shaping device for producing the projection beam with a predetermined projection beam cross-section in the mask plane, and a positioning device for moving the projection beam cross-section in the mask plane along a predetermined path over the mask parallel to the direction into which the struts extend. The apparatus also includes a sensor for supplying a measuring signal which is dependent on the number of charged particles impinging on a mark region provided on the mask.
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申请公布号 |
US7015487(B2) |
申请公布日期 |
2006.03.21 |
申请号 |
US20010934262 |
申请日期 |
2001.08.21 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
KIENZLE OLIVER;ORCHOWSKI ALEXANDER |
分类号 |
G03F7/20;H01J37/304;G03F1/00;G03F1/14;H01J37/305;H01J37/317;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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