| 摘要 |
It is an object of the present invention to provide a glass member resistant against plasma corrosion suitably used as a jig material in producing semiconductors, which exhibits excellent resistance against plasma corrosion, and which is free from the generation of particles. The above problem is solved by a glass member resistant to plasma corrosion, comprising a portion to be exposed to plasma gas, which is made of a glass material containing, as the essential component, one compound component selected from the group consisting of compounds expressed by one of the chemical formulae SiO<SUB>2</SUB>-Al<SUB>2</SUB>O<SUB>3</SUB>-CaO, SiO<SUB>2</SUB>-Al<SUB>2</SUB>O<SUB>3</SUB>-MgO, SiO<SUB>2</SUB>-BaO-CaO, SiO<SUB>2</SUB>-ZrO<SUB>2</SUB>-CaO, SiO<SUB>2</SUB>-TiO<SUB>2</SUB>-BaO, provided that the constitution ratio of the compound components is within the vitrification range.
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