发明名称 Method of film deposition, and fabrication of structures
摘要 A method of fabricating aluminum oxide films utilizing aluminum alkoxide precursors is described. The aluminum oxide film is formed by (a) providing an aluminum alkoxide precursor that is dissolved, emulsified or suspended in a liquid; (b) providing a vapor generated from the aluminum alkoxide precursor; and (c) depositing an aluminum oxide film on the substrate at a temperature greater than 500° C.
申请公布号 US7015152(B2) 申请公布日期 2006.03.21
申请号 US20030674961 申请日期 2003.09.30
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CALLEGARI ALESSANDRO C.;NEUMAYER DEBORAH ANN
分类号 H01L21/30;C23C16/40;C23C16/44;C23C16/455;H01L21/28;H01L21/316;H01L21/8238;H01L27/08;H01L29/49;H01L29/51 主分类号 H01L21/30
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