发明名称 Method of forming thin film patterning substrate including formation of banks
摘要 Display devices such as EL elements or LED elements, or color filters, are provided, wherewith, when forming thin films such as organic semiconductor films or colored resins, there is remarkably little variation in film thickness from pixel to pixel. A method for fabricating thin film elements having banks of a prescribed height and a thin film layer formed by an ink jet method in areas to be coated that are partitioned by those banks is disclosed. Furthermore, banks are formed of an organic material on a bank formation surface configured of an inorganic material, plasma treatment is performed under conditions that the induction gas is fluorine-based and that fluorine is present excessively, and the areas enclosed by the banks subjected to surface treatment are filled with the liquid thin film material to form the thin film layer or layers.
申请公布号 US7015503(B2) 申请公布日期 2006.03.21
申请号 US20030686634 申请日期 2003.10.17
申请人 发明人
分类号 G02B5/20;H01L51/00;G09F9/00;G09F9/30;G09F9/33;H01L27/32;H01L33/26;H01L33/42;H01L33/48;H01L51/40;H01L51/50;H01L51/52;H01L51/56;H05B33/10;H05B33/12;H05B33/14;H05B33/22 主分类号 G02B5/20
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