| 发明名称 |
Chelation cleaning process for repairing photomasks |
| 摘要 |
The present invention relates to a method for repairing a photomask by removing a residual defect in the photomask, the method including removing the defect area by gallium chelation with a water-soluble amine polymer.
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| 申请公布号 |
US7014960(B2) |
申请公布日期 |
2006.03.21 |
| 申请号 |
US20030635982 |
申请日期 |
2003.08.07 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHEN SAME-TING |
| 分类号 |
G03F9/00;A61N5/00;G03F1/00;G21G5/00 |
主分类号 |
G03F9/00 |
| 代理机构 |
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