发明名称 Lithographic apparatus and device manufacturing method
摘要 In a lithographic projection apparatus and a device manufacturing method, a movable part is controlled to produce a motion, an absolute value of at least one of a fourth and a higher derivative to time of the position of the motion being limited to less than a maximal value. Specifying at least one of a fourth and a higher derivative to time of the position may help to improve settling behavior to obtain more accurate positioning. Further, a movable part may be controlled to produce an acceleration of the movable part having a high at least one of a third and a higher derivative to time of the position of the motion at a start portion of the acceleration and a corresponding low at least one of a third and a higher derivative to time of the position of the motion at an end portion of the acceleration, the absolute value of the high at least one of the third and the higher derivative to time of the position of the motion being larger than the absolute value of the corresponding low at least one of the third and the higher derivative to time of the position of the motion.
申请公布号 US7016019(B2) 申请公布日期 2006.03.21
申请号 US20030735846 申请日期 2003.12.16
申请人 ASML NETHERLANDS B.V. 发明人 VAN DEN BIGGELAAR PETRUS MARINUS CHRISTIANUS MARIA;COX HENRIKUS HERMAN MARIE;TSO YIN TIM;DONDERS SJOERD NICOLAAS LAMBERTUS;KNOOPS THEODORUS
分类号 G03B27/58;G03B27/42;G03F7/20;H01L21/027 主分类号 G03B27/58
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