发明名称 Semiconductor memory device
摘要 To realize a semiconductor memory device with reduced cell-to-cell variation in writing characteristics a semiconductor memory has a source region and a drain region, which are formed parallel to each other, and an assist electrode which is between and parallel to the source and drain regions without overlapping, so that at the time of writing, the assist electrode is used as an assist electrode for hot electrons to be injected at the source side and at the time of reading, an inversion layer formed under the assist electrode is used as the source region or the drain region.
申请公布号 US7015540(B2) 申请公布日期 2006.03.21
申请号 US20030684424 申请日期 2003.10.15
申请人 RENESAS TECHNOLOGY CORP. 发明人 ISHII TOMOYUKI;FURUSAWA KAZUNORI;KURATA HIDEAKI;IKEDA YOSHIHIRO
分类号 G11C16/02;H01L29/788;G11C11/56;G11C16/04;H01L21/8247;H01L27/10;H01L27/115;H01L29/423;H01L29/792 主分类号 G11C16/02
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