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发明名称
铜打底电镀浴
摘要
本发明系关于一种铜打底电镀浴,该铜打底电镀浴包含一氰化铜化合物以及一或多种无机酸盐及有机酸盐。该氰化铜化合物较佳系氰化铜钠、氰化铜钾或其等之混合物。
申请公布号
TW200609390
申请公布日期
2006.03.16
申请号
TW094125795
申请日期
2005.07.29
申请人
新光电气工业股份有限公司
发明人
荻原阳子;中泽昌夫
分类号
C25D3/40
主分类号
C25D3/40
代理机构
代理人
恽轶群;陈文郎
主权项
地址
日本
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