| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an improved method to structure a projection system for a lithography apparatus. <P>SOLUTION: In order to calibrate the lithography apparatus, the contrast of aerial images is measured with reference to the setting of a plurality of manipulators that can be utilized by the projection system. The setting value, with which the maximum value can be obtained, is determined as the appropriate setting of the relevant manipulator. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
