| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid immersion exposure technique which can suppress throughput reduction caused by restoring works or the like. <P>SOLUTION: The aligner has an optical system for projecting a pattern of an original plate onto a substrate. The pattern is projected onto the substrate under a condition that a gap between the substrate and the optical system is filled with a liquid. The aligner has a means having a nozzle for supplying the liquid into the gap, and a means for collecting at least the liquid in the nozzle. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
