| 摘要 |
PROBLEM TO BE SOLVED: To prevent redeposition during cleaning a substrate, and to enhance cleanliness. SOLUTION: The cleaning device 100 has cleaning tanks 40a, 40b, 40c, 40d in a form to be filled with a cleaning liquid 41 and to independently house each substrate 2. The cleaning liquid 41 is supplied from the bottom of a recovery tank 44 by a liquid supply pump 46 via a filter 48 and a liquid supply passage 50 to the bottom of each cleaning tank 40a, 40b, 40c, 40d; while the cleaning liquid 41 overflowing the upper open end of the cleaning tank 40a, 40b, 40c, 40d is once reserved in an overflow liquid receiving tank 42, then returned to the recovery tank 44 via a return passage 54 and reused. A plurality of substrates 2 are held by the inner surfaces, by a holding tool 30 provided in a holding device 21 and immersed in the respective cleaning tanks 40a, 40b, 40c, 40d. COPYRIGHT: (C)2006,JPO&NCIPI
|
