发明名称 SEMICONDUCTOR DEVICE
摘要 When a semiconductor film is irradiated with conventional pulsed laser light, unevenness, which is called as ridge, is caused on the surface of the semiconductor film. In the case of a top-gate type TFT, element characteristics are changed depending on the ridge. In particular, there is a problem in that variation in the plural thin film transistors electrically connected in parallel with one another. According to the present invention, in manufacturing a circuit including plural thin film transistors, the width LP of a region (not including a microcrystal region) that is melted by irradiating a semiconductor film with light of a continuous wave laser is enlarged, and active layers of a plurality of thin film transistors (that are electrically connected in parallel with one another) are arranged in one region.
申请公布号 WO2006027912(A1) 申请公布日期 2006.03.16
申请号 WO2005JP13985 申请日期 2005.07.25
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD.;YAMAZAKI, SHUNPEI;TANAKA, KOICHIRO 发明人 YAMAZAKI, SHUNPEI;TANAKA, KOICHIRO
分类号 H01L21/336;H01L21/20;H01L29/786 主分类号 H01L21/336
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