发明名称 CLEAN ROOM
摘要 PROBLEM TO BE SOLVED: To provide a clean room for delivering the cleaned air corresponding to a manufacturing device installed in a clean chamber, and improving space efficiency of a clean area. SOLUTION: The cleaned air supplied toward the substantially horizontal direction in the clean chamber 5 by an air cleaner 6, is delivered to the manufacturing device 10. Thus the cleaned air flows along a glass substrate G horizontally placed on the manufacturing device 10. As a result, the cleaned air is not disturbed even when a processing part 10b is formed at an upper part of the glass substrate G, and the glass substrate G can be constantly sealed by the cleaned air by washing away dust from the processing part 10b. In a case of performing a process of coating the glass substrate G with chemical including a solvent, a rate of diffusion of the solvent to an upper part is decreased by the cleaned air supplied toward the substantially horizontal direction. As an air passage for performing recirculating ventilation of mainly the airflow in the substantially horizontal direction, is formed, a floor or ceiling chamber becomes unnecessary, space efficiency can be improved, and a construction cost for duct work can be reduced. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006071167(A) 申请公布日期 2006.03.16
申请号 JP20040254127 申请日期 2004.09.01
申请人 SHIMIZU CORP 发明人 SUZUKI YOSHINOBU;SHIRATANI TAKESHI;KOMATSUBARA MASAYUKI;KAJIMA TOMOAKI
分类号 F24F7/06;F24F9/00 主分类号 F24F7/06
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