发明名称 Laser gas replenishment method
摘要 Output beam parameters of a gas discharge laser are stabilized by maintaining a molecular fluorine component at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is subject to depletion within the discharge chamber. Gas injections including molecular fluorine can increase the partial pressure of molecular fluorine by a selected amount. The injections can be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure. The amount per injection and/or the interval between injections can be varied, based on factors such as driving voltage and a calculated amount of molecular fluorine in the discharge chamber. The driving voltage can be in one of multiple driving voltage ranges that are adjusted based on system aging. Within each range, gas injections and gas replacements can be performed based on, for example, total applied electrical energy or time/pulse count.
申请公布号 US2006056478(A1) 申请公布日期 2006.03.16
申请号 US20050263626 申请日期 2005.10.31
申请人 发明人 ALBRECHT HANS-STEPHEN;VOGLER KLAUS W.;KLEINSCHMIDT JUERGEN;SCHROEDER THOMAS;BRAGIN IGOR;BERGER VADIM;STAMM UWE;ZSCHOCKE WOLFGANG;GOVORKOV SERGEI
分类号 H01S3/22 主分类号 H01S3/22
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