发明名称 PATTERN CHARACTERISTICS MEASURING METHOD USING SCANNING PROBE MICROSCOPE AND ITS SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a pattern characteristics measuring method using a scanning probe microscope capable of easily grasping changes in shape or properties among a plurality of samples in which the same pattern is formed and provide its system. SOLUTION: A pattern indicating a reference position is molded in a master pattern for measuring the same area among a plurality of samples, and measurements are executed within the area on the basis of the reference pattern. On the basis of measurement results of each sample, a unit area forming the pattern is detected, and shape characteristics etc. within each detected unit area are computed. By displaying changes among the samples such as variations in each type of characteristics within the measured area, accuracy in two-dimensional alignment (pitch variations) in each detected area, etc. are displayed, it is possible to easily grasp changes in characteristics of the patterns. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006071305(A) 申请公布日期 2006.03.16
申请号 JP20040251647 申请日期 2004.08.31
申请人 HITACHI LTD 发明人 BABA SHUICHI;WATANABE MASAHIRO
分类号 G01B21/30;G01Q30/04;G01Q60/24 主分类号 G01B21/30
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