发明名称 MANUFACTURING METHOD OF SUBSTRATE FOR ELECTRO-OPTIC DEVICES, DEVELOPING DEVICE OF SUBSTRATE FOR ELECTRO-OPTIC DEVICE, AND MANUFACTURING METHOD OF ELECTRO-OPTIC DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a substrate for an electro-optic device with a predetermined pattern easily and accurately obtained, and to provide a developing device of a substrate for an electro-optic device, and a manufacturing method of an electro-optic device. <P>SOLUTION: In the manufacturing method of a substrate for an electro-optic device, the developing device of a substrate for an electro-optic device, and the manufacturing method of an electro-optic device, they comprise the steps of forming a resin layer on the substrate for the electro-optic device by laminating a photo sensitive material, conducting a pattern exposure to the resin layer through a photomask, and forming the predetermined pattern to the resin layer by continuously supplying a developing solution in membrane. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006073914(A) 申请公布日期 2006.03.16
申请号 JP20040258014 申请日期 2004.09.06
申请人 SEIKO EPSON CORP 发明人 WACHI REIKO;WANIKAWA KUNIO;MARUYAMA KUNIO
分类号 H01L21/027;G02F1/13;G02F1/1333;G03F7/20;G03F7/30;G09F9/00 主分类号 H01L21/027
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