发明名称 ULTRA-THIN DIE AND METHOD OF FABRICATING SAME
摘要 In accordance with a specific embodiment, a method of processing a semiconductor substrate is disclosed whereby the substrate is thinned, and the dice formed on the substrate are singulated by a common process. Trench regions (42, 43) are formed on a backside of the substrate. An isotropic etch of the backside results in a thinning of the substrate while maintaining the depth of the trenches, thereby facilitating singulation of the die.
申请公布号 WO2006007142(A3) 申请公布日期 2006.03.16
申请号 WO2005US17703 申请日期 2005.05.19
申请人 FREESCALE SEMICONDUCTOR, INC.;MANCINI, DAVID, P.;CHUNG, YOUNG;DAUKSHER, WILLIAM, J.;WESTON, DONALD, F.;YOUNG, STEVEN, R.;BAIRD, ROBERT, W. 发明人 MANCINI, DAVID, P.;CHUNG, YOUNG;DAUKSHER, WILLIAM, J.;WESTON, DONALD, F.;YOUNG, STEVEN, R.;BAIRD, ROBERT, W.
分类号 H01L21/301;H01L21/46 主分类号 H01L21/301
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