| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To suppress the occurrence of a defect in the base of a thin film (mask layer). <P>SOLUTION: The method for manufacturing a mask blank having a thin film as a mask layer formed on a light transmitting substrate 10, the thin film to be used as a mask layer for patterning a base (halftone film 12) by etching, is characterized in that: the thin film comprises a plurality of layers (light shielding films 14, 16); the thin film is formed in a plurality of steps by each layer; and the surface of each layer is cleaned every time of forming the layer of the thin film. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
