发明名称 Herstellungsverfahren für einen Halbleiterchip
摘要 The present invention relates to a semiconductor device, and more particularly to a structure of a semiconductor wafer and a fabrication method of semiconductor chips. According to the present invention, a semiconductor wafer containing a plurality of semiconductor chip portions has a plurality of chip scribe lanes formed between the semiconductor chip portions. A plurality of chip bonding pads are formed on the semiconductor chip portions of the wafer, and a plurality of wafer probing pads are formed on the chip scribe lanes. The wafer probing pads are electrically connected to internal circuits of the semiconductor chip portions and/or to corresponding ones of the chip bonding pads.
申请公布号 DE19835840(B4) 申请公布日期 2006.03.16
申请号 DE1998135840 申请日期 1998.08.07
申请人 LG SEMICON CO., LTD. 发明人 KIM, JAE WOON;PARK, JONG HOON
分类号 H01L21/66;H01L21/78;H01L21/60;H01L23/485;H01L23/50;H01L23/528;H01L23/58 主分类号 H01L21/66
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