ELECTRON-BEAM OR EUV (EXTREME ULTRAVIOLET) RESIST COMPOSITION AND PROCESS FOR THE FORMATION OF RESIST PATTERNS

摘要

An electron-beam or EUV resist composition comprising (A) a resin component which can be changed in alkali solubility by the action of an acid and (B) an acid generator component which can generate an acid on being exposed to light, characterized in that the component (B) contains at least one of the onium salts bearing anions represented by the general formulae (b-0-1) and (b-0-2): wherein X is C_2-6 alkylene wherein at least one hydrogen is replaced by fluorine; and Y and Z are each independently C_1-10 alkyl wherein at least one hydrogen is replaced by fluorine.