| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an electronic part having a small contact resistance and to provide a method of manufacturing the same. <P>SOLUTION: The electronic part includes lower layer metal wiring 4, an interlayer insulating film 6 formed on the lower layer metal wiring 4, and upper layer metal wiring 7 formed on the interlayer insulating film 6 and electrically connected to the lower layer metal wiring 4 via a through hole 5 formed in the interlayer insulating film 6. The lower layer metal wiring 4 is made by diffusing at least a first metal and a second metal. The first metal has a large standard forming free energy of the oxide from the second metal. The second metal has a higher reflecting rate at least at one point of the beam having a wavelength of 350-440 nm than the first metal, and has a close contact layer 7 formed of a metal having smaller standard forming energy of the oxide than the first metal between an upper layer metal wiring 8 and the lower layer metal wiring 4. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
