发明名称 ELECTROLESS AND IMMERSION PLATING OF INTEGRATED CIRCUITS USING AN ACTIVATION PLATE
摘要 The invention provides a method of plating an integrated circuit. An activation plate is positioned adjacent to at least one integrated circuit. The integrated circuit includes a plurality of bond pads comprising a bond-pad metal, and the activation plate also comprises the bond-pad metal. A layer of electroless nickel is plated on the bond pads and the activation plate, and a layer of gold is plated over the layer of electroless nickel on the bond pads and the activation plate. An integrated circuit with bond pads plated using the activation plate, and a system for plating an integrated circuit is also disclosed.
申请公布号 KR20060024448(A) 申请公布日期 2006.03.16
申请号 KR20057025457 申请日期 2005.12.30
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 DEAN TIMOTHY B.;LYTLE WILLIAM H.
分类号 H01L21/60;C23C18/16;C25D11/18;H01L21/302;H01L21/44;H05K3/24 主分类号 H01L21/60
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