发明名称 METHOD AND DEVICE FOR DETECTING ABNORMALITY IN THERMAL PROCESS, TEMPERATURE CONTROLLER, AND PROGRAM
摘要 <p><P>PROBLEM TO BE SOLVED: To directly detect abnormality in a thermal process when treating an object by a thermal processing means without providing sensor to the object. <P>SOLUTION: The temperature of a hot plate 1 is measured in a plurality of normal thermal processes in advance. The feature quantity is extracted from an obtained temperature data to generate a Malalanobis space (reference space) 13. The actual thermal process which is an object to be determined is started, and the temperature of the hot plate 1 in the thermal process is measured. The feature quantity is extracted from the obtained temperature data, which is used to calculate Mahalanobis distance in the Mahalanobis space. The distance is compared with a predetermined threshold value 9 for determining presence of abnormality in the thermal process. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006073602(A) 申请公布日期 2006.03.16
申请号 JP20040252115 申请日期 2004.08.31
申请人 OMRON CORP 发明人 MIYAJI TOSHIRO;YAMADA TAKAAKI;TANAKA MASAHITO;IWAI YOSUKE
分类号 H01L21/02;G05B23/02 主分类号 H01L21/02
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