| 摘要 |
PROBLEM TO BE SOLVED: To prevent occurrence of void phenomenon, and to prevent occurrence of a BM residue in an opening part of the BM. SOLUTION: A method for manufacturing a light shielding film at least includes steps: to prepare a transparent substrate 1 with a metal thin film pattern 2 formed on one surface thereof; to form a negative type photosensitive resin layer 3 with a light shielding property on the one surface of the transparent substrate 1 of a region including at least a region of the metal thin film pattern 2; to expose the photosensitive resin layer 3 from the transparent substrate 1 side by using the metal thin film pattern 2 as a mask; and to form the opening part CH from which the metal thin film pattern 2 is exposed on the photosensitive resin layer 3 by developing the photosensitive resin layer 3. COPYRIGHT: (C)2006,JPO&NCIPI
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