发明名称 |
MICRO ELECTROMECHANICAL ELEMENT, OPTICAL MICRO ELECTROMECHANICAL ELEMENT, LIGHT MODULATION ELEMENT AND LASER DISPLAY |
摘要 |
PROBLEM TO BE SOLVED: To optimize the beam inclination amount while restraining the bending of a beam even if the beam is made micro-sized in a micro electromechanical element requiring an inclination in the surface shape of the beam. SOLUTION: A lower electrode 43 is provided with a beam 45 opposite thereto through a space 44 and supported at the end parts, and the beam 45 is provided with a step 51 for causing inclination in the width direction of the beam. The step 51 is provided with a means 52 for relaxing the stress of a triple point. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006068843(A) |
申请公布日期 |
2006.03.16 |
申请号 |
JP20040253588 |
申请日期 |
2004.08.31 |
申请人 |
SONY CORP |
发明人 |
SARUTA NORIHIKO;ITO YASUYUKI;KINOSHITA TAKASHI |
分类号 |
B81B3/00;G02B26/08 |
主分类号 |
B81B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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