发明名称 MICRO ELECTROMECHANICAL ELEMENT, OPTICAL MICRO ELECTROMECHANICAL ELEMENT, LIGHT MODULATION ELEMENT AND LASER DISPLAY
摘要 PROBLEM TO BE SOLVED: To optimize the beam inclination amount while restraining the bending of a beam even if the beam is made micro-sized in a micro electromechanical element requiring an inclination in the surface shape of the beam. SOLUTION: A lower electrode 43 is provided with a beam 45 opposite thereto through a space 44 and supported at the end parts, and the beam 45 is provided with a step 51 for causing inclination in the width direction of the beam. The step 51 is provided with a means 52 for relaxing the stress of a triple point. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006068843(A) 申请公布日期 2006.03.16
申请号 JP20040253588 申请日期 2004.08.31
申请人 SONY CORP 发明人 SARUTA NORIHIKO;ITO YASUYUKI;KINOSHITA TAKASHI
分类号 B81B3/00;G02B26/08 主分类号 B81B3/00
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