发明名称 |
Lithographic apparatus, gas supply system, method for purging, and device manufacturing method and device manufactured thereby |
摘要 |
A lithographic apparatus includes an illumination system for providing beam of radiation, and a support structure for supporting a patterning device. The patterning device imparts the beam of radiation with a pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a gas supply system for supplying a purge gas including oxygen to a plurality of spaces in the apparatus. The gas supply system is arranged so that the purge gas supplied to each of the plurality of spaces is a premixed purge gas mixture composed by the gas supply system for each of the plurality of spaces on the basis of a predetermined relationship that relates a desired amount of oxygen in the premixed purge gas mixture to the respective space to which that premixed purge gas mixture is supplied.
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申请公布号 |
US2006055900(A1) |
申请公布日期 |
2006.03.16 |
申请号 |
US20040941017 |
申请日期 |
2004.09.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DER NET ANTONIUS J.;VAN DER VEEN PAUL;VAN DE VIJVER YURI J.G. |
分类号 |
G03B27/52;G03B27/42 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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